Optical membrane element having a longitudinally adjustable connecting element

ABSTRACT

An optical membrane element for an optical device in lithography, especially EUV (extreme ultraviolet) lithography, includes at least one membrane layer and a frame, which at least partially surrounds the membrane layer and at which at least part of the rim of the membrane layer is mounted. At least one tautening element is provided, which facilitates tautening of the membrane layer and wherein the optical membrane element can be used in a projection exposure system, especially for EUV lithography, such that the membrane layer of the membrane element can be adjustably tautened, such that the membrane layer is flat. A method for manufacturing a corresponding optical membrane element includes generating a tautening element lithographically together with the membrane layer.

CROSS-REFERENCE TO RELATED APPLICATIONS

This application is a continuation of, and claims benefit under 35 USC120 to, U.S. application Ser. No. 12/748,896, filed Mar. 29, 2010, whichis a continuation of, and claims benefit under 35 USC 120 to,international application PCT/EP2008/063170, filed Oct. 1, 2008, whichclaims benefit of German Application No. 10 2007 047 149.3, filed Oct.2, 2007 and U.S. Ser. No. 60/976,900, filed Oct. 2, 2007. U.S.application Ser. No. 12/748,896 and international applicationPCT/EP2008/063170 are hereby incorporated by reference in theirentirety.

FIELD

The disclosure relates to an optical membrane element for an opticaldevice in lithography, especially EUV (extreme ultraviolet) lithography,including at least one membrane layer and a frame, which at leastpartially surrounds the membrane layer and at which at least part of theedge of the membrane layer is mounted, as well as a projection exposuresystem, especially for EUV lithography, in which a correspondingmembrane element is provided, and also a method for the use of such amembrane element and a method for making such an optical membraneelement.

BACKGROUND

For the production of the finest structures in electrotechnical and/ormicromechanical components on the nanometer scale, it is desirable forlight or generally electromagnetic radiation of ever decreasingwavelengths be used for the lithography method underlying themanufacturing process. Accordingly, projection exposure systems forilluminating and imaging a reticle containing the desired microstructureor nanostructure are known that employ electromagnetic radiation in therange of extreme ultraviolet light. For this technique, called EUVlithography, optical membranes are used in order that they may serve,for example, as spectral filters, as described in U.S. Pat. No.7,154,666 B2. In addition, there are other applications in the field ofEUV lithography, such as those described in U.S. Pat. No. 7,153,615,U.S. Pat. No. 6,749,968, U.S. Pat. No. 6,683,936 and U.S. Pat. No.6,150,060. Because the application areas referred to in these documentsconstitute potential applications for the optical membrane element ofthe disclosure, the disclosure content of these publications isincorporated by reference herein in their entirety.

U.S. Pat. No. 5,068,203 furthermore discloses how, for example, a thinsilicon membrane may be produced. Its disclosure content, too, isincorporated herein by reference.

The membranes usually have a very low thickness in the range of 50 to500 nm and are desirably planar and smooth in order that they may beused in optics without causing aberrations. The extended area of themembranes can range from 0.5 mm edge length or diameter to several 100mm edge length or diameter.

SUMMARY

In some embodiments, the disclosure provides an optical membrane or anoptical membrane element which has the desired planarity, i.e. membraneflatness, for use in optics and thus especially avoids wrinkling and thelike. In addition, the membrane element can be easy to produce and usewhile meeting the desired optical properties such as transmission, etc.

The disclosure proceeds from the fundamental idea that a planar, smootharrangement of an optical membrane is possible if the membrane can beselectively tautened. In the case of optical membranes, such as thosemade from silicon or zirconium, which inherently have very little or nomembrane tension due to the way they are manufactured, the planarity orflatness is impaired because the lack of tension leads to wrinkling.Other membranes, such as those made from silicon nitride, have highproduction-related membrane tensions, whose unevenness is due tointernal tensions or to the membrane's being arranged on a supportstructure. All these problems can be resolved through selectivetautening of the membrane. For example, wrinkling, too, which is due tointernal tensions created by coatings, such as zirconium on silicon, canbe removed by selective tautening.

The disclosure provides an optical membrane element, which has at leastone membrane layer and a frame, which at least partially surrounds themembrane layer and to which is attached or mounted at least part of theedge of the membrane layer. Through the provision of a least onetautening element which can act upon the membrane layer, selectivetautening of the membrane layer can be achieved.

Several tautening elements can be distributed around the circumferenceof the membrane layer and/or the frame in order that an uneven state oftension in the membrane layer may be compensated for by correspondingactuation of individual tautening elements in each direction.Especially, it is advantageous to provide at least two tauteningelements for the purpose of introducing tensile forces into the membranelayer in independent spatial directions. A high number of tauteningelements makes for more selective and more accurate tautening of themembrane layer.

If the tautening of the membrane layer proceeds via deformation of theframe at which the membrane layer is arranged, it is advantageous forthe frame to be capable of corresponding elastic deformation.

Alternatively, or additionally, the frame can be formed from or includea plurality of separate retaining elements, such that the membrane layercan be tautened by a movement of separate, individual retainingelements.

The frame of the membrane layer can be accommodated in a holder, withthe tautening elements capable of being provided between the frame andthe holder. The tautening elements can be formed as longitudinallyadjustable connecting elements between the frame and holder, such that achange of length of the connecting elements generates forces and thetension of the membrane layer is adjustable. Candidate longitudinallyadjustable connecting elements may especially be adjusting screws andthe like. In addition, however, other actuators, such as piezoelectricelements, and the like may be provided. The tautening elements can alsobe spring elements, such as tension springs or linear springs.

In some embodiments, the desired tensile forces can be generated on themembrane layer by generating torque in connection with swivel joints,rather than by direct linear movements or displacements. For example,between a holder on one hand and frame or retaining elements on theother, at least one, preferably several swivel joints can be providedwhich transform a generated torque into a linear force. The desiredtorque may, for example, be generated in turn by a longitudinallyadjustable spacer especially in the form of an adjusting screw or apiezoelectric actuator. Here, too, other actuators which can generatetorques may be used.

In addition to a torque, which is converted into a linear tensile forceon the membrane layer via a rotary axis parallel to the plane of themembrane layer, other deformations or types of force application can beused to apply tension in the plane of the membrane layer. For example,the frame may be formed as two parts, with a first, inner part isconnected to the membrane layer and the second outer part connectable toa holder. The two parts may be connected via spring bars, which, uponelastic deformation, cause the inner part of the frame to expand andthus in turn generate tensile forces in the plane of the membrane layer.

Through the various ways of generating tensile forces or tensilestresses in the plane of the membrane layer, it is possible to stretchthe membrane layer and thus to generate a smooth and planar shape of themembrane layer. Especially, the tension of the membrane layer of themembrane element is thus adjustable, with the adjustment relating toboth the magnitude and the direction and thus the local distribution ofthe tension. As a result, unevenness and wrinkling, whether due to anabsence or deficiency of tension or to unevenly distributed (inherent)tension, are avoided or compensated for.

The membrane element with corresponding tautening elements thus alsoallows readjustment of the tension as time passes, for example whenrelaxation has occurred or when different environmental conditions, suchas radiation-induced heating and the like, involve changes.

The optical membrane element can be generated especially by alithographic manufacturing method in order that, for example, at lowmembrane dimensions of 0.5 mm edge length or diameter, thecorrespondingly involved micromechanical components for the tauteningelements may be produced. Correspondingly, the membrane layer and theframe as well as the holder and the frame plus the holder, frame andmembrane layer can be formed as one piece.

The membrane layer can have a thickness of 50 nm to 500 nm (especially100 nm to 250 nm), and edge lengths or diameters ranging from 0.5 mm to200 mm (especially 1 mm to 100 mm).

The membrane layer can have multiple plies and/or include functionalelements such as lattice structures and the like as well as filterlayers. Accordingly, an optical membrane element can be provided in aprojection exposure system, especially an EUV projection exposure systemwhere it may serve as transmission reticle, debris filter, attenuator,spectral filter, pellicle, transmission grid, or transmission filter.

Especially preferred is a use of corresponding membrane elements inconnection with measuring devices for recording the optical imagingproperties.

The membrane layer can include silicon, zirconium, ruthenium, rhodium,niobium, molybdenum, boron and/or silicon nitride.

An element of the optical membrane element can have a quadratic shape, arectangular shape, a polygonal shape, a circular shape, or an oval basicshape. The membrane layer has a thickness of 5 nm to 500 nm. Themembrane layer can include one of more of functional elements, multipleplies, filter layers and optically active structures.

BRIEF DESCRIPTION OF THE FIGURES

Further advantages, characteristics and features of the disclosure areapparent from the following detailed description of embodiments usingthe enclosed drawings. The drawings show in purely schematic form:

FIG. 1 is a plan view of a first embodiment of an optical membraneelement;

FIG. 2 is a plan view of a second embodiment of an optical membraneelement;

FIG. 3 is a cross-section through a membrane element according to FIG. 1or 2;

FIG. 4 is a plan view of a third embodiment of an optical membraneelement;

FIG. 5 is a partial cross-section through the membrane element of FIG.4;

FIG. 6 is a plan view of a fourth embodiment of an optical membraneelement;

FIG. 7A is a partial cross-section of the membrane element from FIG. 6;FIG. 7B is a partial cross-section of a membrane element having anadjustable screw element; FIG. 7C is a partial cross-section of amembrane element having a piezo actuator;

FIGS. 8a-8c show the sequences involved in lithographic manufacturing ofa silicon membrane via an SOI (Silicon On Insulator) wafer;

FIG. 9 is a cross-section of a multi-ply membrane layer;

FIG. 10 is a cross-section of a membrane layer with functional elements;

FIG. 11 is an illustration of a projection exposure system, in which anmembrane element is used;

FIG. 12 is an illustration of a part of an illumination system for aprojection exposure system with membrane elements;

FIG. 13 is a projection exposure system with application areas formembrane elements; and

FIG. 14 is a part of a projection exposure system in the wafer stagewith an membrane element.

DETAILED DESCRIPTION

FIG. 1 is a plan view of a first embodiment of an optical membraneelement 1, in which the membrane layer 2 has a rectangular base area orbasic shape when the layer thickness is ignored.

The membrane layer 2 is held at the sides of the rectangular basicshape, i.e. the end faces, by retaining elements 3, 4, 5 and 6, whichtogether form a frame 7. Provided in each of the retaining elements 3,4, 5, 6, is a coupling element in the form of an opening 8, 9, 10, 11,with which a tautening element, not shown in detail, can engage. Via thetautening element and in accordance with the arrows shown at openings 8,9, 10 and 11, forces are generated which place the membrane layer 2under tensile stress.

In order that the forces may be generated, the tautening elements can becounter-mounted in a holder, not shown, which, for example, can also beformed by a housing of an optical device, such that, for example, byshortening the tautening elements, for example in the form of adjustingscrews and the like, the tension in the membrane layer 2 can beproduced.

FIG. 2 shows in an illustration similar to FIG. 1 a further embodimentof a membrane element 1, in which similar or identical components arelabelled with the same reference symbols. The embodiment of the membraneelement of FIG. 2 differs from that of FIG. 1 in that the membrane layerhas an octagonal base area or basic shape instead of a rectangular area.Correspondingly, instead of the four retaining elements 3, 4, 5 and 6according to the embodiment of FIG. 1, retaining elements 3 to 6 and 17to 20 are provided, which, depending on the dimension of thelongitudinal extension of the side of the membrane layer 2 at which theyare arranged, are also formed differently. However, the retainingelements 3 to 6 and 17 to 20 also have corresponding coupling elements 8to 15 in the form of an opening for engagement with a tautening element,like the retaining elements 3 to 6 of the embodiment of FIG. 1.

FIG. 3 shows schematically in a cross-sectional view the functioning ofthe optical membrane elements, as illustrated in FIGS. 1 and 2. FIG. 3shows a cross-section through the retaining elements 3 and 5, moreprecisely, through the corresponding openings 8 and 10, which serve thepurpose of engagement with the tautening elements. If, for example,force, as indicated by the arrows, is exerted on the retaining elements3 and 5 by shortening the tautening elements (not shown) arrangedbetween the retaining elements 3, 5 and a surrounding holder (notshown), the retaining elements 3 and 5 are caused to move apart. Sincethe retaining elements 3 and 5, however, are firmly connected to themembrane layer 2, the membrane layer 2 is placed under tensile stressand is pulled apart or is elastically and/or plastically stretched.Typically, the force should be large enough to produce planar smoothingand elastic tautening only, but not to induce plastic strain on themembrane layer.

The arrangement of the membrane layer 2 at the retaining elements 3 to 6or 17 to 20 can be effected by a positive-locking, or force closure orbonded connection (material continuity), with especially the membranelayer attachable by a clamp, a weld or an adhesive bond. It is alsoconceivable for the retaining elements to form one piece with themembrane layer, for example in the case of lithographic production ofsilicon membranes.

Moreover, it is also conceivable for a membrane element to be formed soas to be gastight, with, for this purpose, a holder is provided aroundthe membrane layer 2 and the retaining elements 3 to 6, such as shown inthe embodiment of FIG. 4. The holder (not shown) is formed such that theholder can be accommodated gastight in a housing of the projectionexposure system. The membrane layer 2, such as provided in embodimentsof FIGS. 1 to 3, is also arranged gastight at the holder, such that nomembrane-free space remains between the points of attack of theretaining elements 3 to 6 or tautening elements at the membrane and theholder. The tautening elements act in such a manner that an inner areaof the membrane layer 2 is tautened by the tautening elements, while theouter area of the membrane layer is connected gastight to the holder 32,but rather than being tautened serves to accommodate the folded parts ofthe membrane.

FIG. 4 shows a further embodiment of an optical membrane element inwhich the membrane layer 2 has a circular base area. Correspondingly,the surrounding frame 7 is formed as a circular ring. The frame 7 issurrounded by a holder 32, which includes a plurality of tauteningelements 30, which are spaced equidistantly around the membrane layer 2and the frame 7. The mechanical tautening elements 30 each have a swivelor bending joint 31, which, as a one-piece solid-body joint in the formof a film hinge, connects the holder 32 to the frame 7. Accordingly, theswivel joint 31 is essentially formed by a thin, flexible bar, whichconnects the frame 7 to the holder 32 as one piece.

The holder 32 is also formed as a circular ring, with an extension 34being formed in the zone of the mechanical tautening elements 30 inorder that an adjusting screw 33 may be arranged at a distance from theswivel joint 31 such that the screw interacts with that part of theframe 7 which is remote from the swivel joint. The interaction proceedsin such a way that the adjusting screw 33 is fed in through a threadedhole in the extension 34 and one of its ends stops against that part ofthe frame 7 which is spaced apart from the swivel joint 31. Throughturning the adjusting screw 33, the distance between the frame part 7and the extension 34 of the holder 32 can be modified, such thatswivelling about the swivel joint 31 occurs. If, as a result, that partof the frame 7 which is spaced apart from the swivel joint 31 movestowards the membrane layer 2, the opposite part of the frame 7 to whichthe membrane layer 2 is attached, moves outwards and thus exerts atensile force which acts on the membrane layer 2. Correspondingly, atensile strain can be exerted on the membrane layer 2. Throughadjustment of the adjusting screw 33 at the mechanical tauteningelements 30 provided around the membrane layer, a desired tensile straincan be adjusted. Especially, the mechanical tautening elements can beindividually adjusted such that a planar, smooth formation of themembrane layer 2 is ensured.

FIG. 6 shows a fourth embodiment of an optical membrane element 1, whichhas an essentially rectangular membrane layer 2. The membrane layer 2 isheld in a frame 7 which includes an outer frame part 40 in the form of arectangular ring and an inner frame part 41 with individual retainingelements, which are firmly connected to the membrane layer 2. Betweenthe outer frame part 40 and the inner frame part 41 or the retainingelements 41 are provided spring bars 42, which, as shown in more detailin FIG. 7A, are formed so as to be elastically deformable.Alternatively, an adjustable screw element 136 as shown in FIG. 7B, or apiezo actuator 236 as shown in FIG. 7C can be used instead of thecircumferential bar 36 shown in FIG. 7A.

The holder 32, too, consists of a rectangular ring structure in whichaccommodation elements 35 are provided which can accommodate the outerframe part 40 by clamping. Formed on the inner side of the holder ring32 is a circumferential bar 36, which interacts with the inner framepart 41 or the retaining elements such that the spring bars 42 are bentperpendicularly to the plane of the membrane layer 2. This leads toexpansion of the membrane layer 2 and to the introduction of acorresponding tensile stress.

Through appropriate choice of the height of the circumferential bar 36,a defined stress can be set. In addition, the peripheral bar 36 isformed such that, for example, oblique sliding surfaces or the likeensure that the tension is maintained permanently.

Instead of the circumferential bar 36, it is also conceivable to provideadjusting screws, which are fed, for example, through the holder ringperpendicular to the plane of the membrane layer 2 and, uponaccommodation in corresponding threaded holes, can form a defined stopfor the inner frame part 41 or the individual separate retainingelements. FIGS. 8a-8c show the procedural method adopted in thelithographic manufacture of a thin silicon membrane with a layerthickness of, for example, 100 nm.

To this end, in the first step, which corresponds to the image of FIG.8a ), a so-called SOI wafer (Silicon-On-Insulator wafer) is provided inwhich two silicon partial layers 50 and 52 are separated by a partiallayer of silicon dioxide 51. A photoresist 53 is applied to the surfaceof the partial silicon layer 52 so that zone 54 has no photoresist, sothat the partial silicon layer there can be etched away in a sub-step inaccordance with FIG. 8b ). The structure of the photoresist with theresist-free zone 54 is produced by corresponding lithographic exposureof the photoresist and subsequent removal of the uncured photoresist.

After the etch-stop layer of silicon dioxide 51 is reached duringetching of the silicon in zone 54, photoresist 53 and the partialsilicon dioxide layer 51 in the window area 54 are removed, such that afree-standing silicon membrane remains in zone 54.

Similarly, further steps can be introduced before, after and/or duringthe membrane production to effect structuring in those zones whichsurround the window area 54 and which can find use as a frame, in orderthat mechanical tautening elements may be generated, such as those shownin FIG. 5.

FIGS. 9 and 10 show the basic structure of membrane layers, as can beused in accordance with the disclosure. For example, FIG. 9 shows atwo-layer membrane 2, which includes the partial layers 60 and 61, whichconsist, for example, of silicon and zirconium.

FIG. 10 shows a membrane layer 2 which includes a basic layer 62, forexample, of silicon, on which functional elements, such as latticestructures 63 and the like, have been applied.

The optical membrane elements can be used in projection exposure systemsfor microlithography, that is, in illumination systems or projectionoptics, more especially in projection exposure systems which work withlight, that is, electromagnetic radiation in the extreme ultravioletrange. One possible wavelength here, for example, is 13.5 nm.

The optical membrane elements can be used as transmission reticles 102,wherein a structured absorber 112 is applied to a free-standing membrane111 from transmitting material, such as silicon or silicon nitride (seeFIG. 11). Due to the absorbent structure 112, a structure to be producedon a wafer 104 can be created, which is imaged in miniature onto thewafer via projection optics 103. FIG. 11 further shows the EUV lightsource 100 and the illuminating system 101.

The transmission reticle 102 includes, in addition to the membrane 111and the absorber 112 deposited thereon, a tautening device 110 inaccordance with the disclosure, which ensures that the membrane 111 issmooth and planar under tension.

Another possible application consists in using corresponding opticalmembrane elements as debris filters, which serve to isolate one zone ofa projection exposure system in which contamination exists or may arisefrom other zones. For instance, the light source can be segregated fromthe rest of the projection exposure system through a correspondingdebris filter. The debris filter allows passage of the light used forimaging, for example, EUV radiation, but neutral particles or ionscannot pass through the filter.

Another possible use of the optical membrane elements is as spectralfilter for filtering out a certain wavelength of the light employed orelectromagnetic radiation generally.

Corresponding membrane elements can also be used in combination, such asdebris filter and spectral filter. This is shown in FIG. 12 for a partof an illumination system for an EUV lithography system. The light of anEUV light source 100 is collected via a so-called Wolter collector 150and focussed onto a mirror 154, from where it is directed to a furthermirror 160 via an intermediate image 155.

A plasma position sensor 153 and an intermediate image position sensor159 are provided for the purpose of monitoring the illumination system.Corresponding membrane filters 151 and 158 are provided to protect suchsensors. Moreover, another debris filter 156 is provided in the vicinityof the intermediate image.

The combined debris spectral filter 151 is arranged in front of a mirror152, which blocks a portion of the light 150 collected by the Woltercollector from the light source 100 in the direction of the plasmaposition sensor 153. The plasma position sensor serves to monitor andcheck the state of the EUV light source 100.

The same applies to the intermediate image position sensor 159, by whichthe location of the intermediate image can be monitored. To this end, aportion of the light from the beam is blocked via the mirror 157 anddeflected to the intermediate image position sensor 159. Providedbetween mirror 157 and intermediate image position sensor 159 is, again,a combined debris spectral filter 158.

Through the combined debris-spectral filters 151 and 158, unwantedcontamination can, for example, be prevented from reaching the sensorand, moreover, a wavelength range of light which is unfavourable for thesensor can also be blocked.

The debris filter 156, in contrast, only takes on the function ofpreventing contamination from spreading out along the beam.

FIG. 13 shows an EUV projection exposure system with an EUV light source100, whose light is directed to a reticle 200 via the mirror elements M0to M5, which constitute the illumination system. The reticle 200, whichis configured not as a transmission reticle but rather as a reflectionreticle, reflects the illumination light, with the structure provided atthe reticle 200 being imaged onto a wafer 300 via projection opticshaving mirror elements M6 to M10.

In the projection exposure system of FIG. 13, various membrane elementsin accordance with the present disclosure are provided in the form ofdebris filters, graduated grey filters, pellicle, spectral filters or inconnection with inline measuring technology.

Thus, according to FIG. 13, a first debris filter 201 is arrangedrelative to the light source 100, such that the particles formed in thelight source, such as ions, neutral particles and the like, cannot reachthe rest of the projection exposure system.

While the debris filter 201 can be arranged only in the area of thebeam, it is advantageous for the debris filter 201 to be formed suchthat gas-tight separation obtains. Accordingly, a gastight arrangementof the membrane with its frame or its holder in a housing or housingcomponent may be provided.

Since the membrane is usually formed so as to be very thin, the thermalconductivity of the membrane itself is low, such that the membrane heatsup upon corresponding absorption of electromagnetic radiation. It istherefore advantageous for the filters or membranes to be placed wherethe light output per surface element is as low as possible in order thatthe temperature load may be kept low. It follows therefrom that thecorresponding membranes can be formed so as to have a very largesurface, a fact which in turn involves the tension for achieving asmooth membrane is particularly important.

Although such debris filters can be used throughout the system, as FIG.12 has already shown, use with respect to segregation of the lightsource, as with the debris filter 201, as well as segregation of theprojection exposure system relative to the wafer 300 via a debris filter206 is preferred.

Irradiation of the photosensitive layer on the wafer 300 causes therelease of possibly aggressive chemical components, which may lead toimpairment of the optical components of the projection system. Thedebris filter 206 hinders these released chemical components of thewafer or of the layers provided thereon.

In addition, an optical membrane element can also serve as a pellicle203 for protecting the reticle.

Where the optical membrane serves as pellicle 203, the membrane elementis provided in connection with the reticle to protect the latter againstparticles, which could reach the reticle, especially during handling ofthe reticle, such as during reticle changing or during transport of thesame. Since the pellicle is arranged so as to be spaced apart from thereticle and firmly connected to it, any particles can be deposited onthe pellicle only, with, due to the arrangement outside the reticleplane, the particles not being imaged to the same level of sharpness asthe structures of the reticle and thus unfolding a less harmful effect.A pellicle membrane could, for example, be made of silicon or zirconium,as these facilitate maximum possible transmission of the EUV light.

A further application for optical membrane elements in accordance withthe present disclosure is the use as graduated grey filter 202, 204 foraveraging the illumination. The graduated grey filters can be used hereeither for uniform illumination of the field (graduated grey filter 202)or the pupil (graduated grey filter 204). In the case of the graduatedgrey filters 202, 204, an absorber layer is provided on the membranewith a gradient across the thickness of the layer, such thatnon-uniformity of the intensity distribution is compensated. Evenlattice structures which lead to averaging of the intensity through arefractive effect are conceivable. The absorber layer can be made ofaluminium, chromium, tantalum nitride, carbon or other elements of lowtransmission for EUV light.

Instead of an absorber layer with thickness gradient or with latticestructure, it is also conceivable for averaging of the light intensityto be adjusted by a dynamic filter, which is formed so as to bedisplaceable.

Another application area is characterised by the spectral filter 205intended to filter out light of certain wavelengths. This is for exampletrue for so-called deep ultraviolet radiation, which, for example, isdetrimental to the photosensitive layer of the wafer. The spectralfilter can basically be provided anywhere in the projection exposuresystem or, as the embodiment of FIG. 12 shows, be combined with otherfilters.

There are also possible applications in connection with measuringtechnology, as already described for FIG. 12. Aside from measurements inthe illumination system, as shown in FIG. 12, the optical membranes canalso be used for so-called inline measuring technology in the area ofthe wafer, as illustrated by the membrane element 216, which is shown indetail in FIG. 14.

The so-called inline measuring technology of the wafer stage 212 cantake the form of transmission image sensors (TIS) and so-called Iliassensors (integrated lens interferometers at scanner, ILIAS). Suchsensors are described, for example, in EP 1 510 870 A1, which is herebyincorporated by reference in its entirety.

FIG. 14 is a cross-sectional view of the arrangement of a correspondingmembrane element 216 with the frame or the tautening device 218 as wellas the membrane 219 and the absorber 210 deposited thereon. Below themembrane 219 in the area of the wafer stage 212 (substrate holder) isprovided, for example, an intensity sensor or an EUV camera 217.

The structuring of the absorber 210 on the membrane 219 in the form of alattice, for example, enables the wave front aberration of the EUVradiation 211 to be determined.

In addition to the application possibilities which have been shown inrelation to FIGS. 11 to 14, further applications of correspondingmembrane optical elements are also possible. These arise for a personskilled in the art from the depiction of the described possible uses andthe cited advantages of the optical membrane elements.

Although the present disclosure has been described in detail using thesample embodiments, it is clear to a person skilled in the art that thedisclosure is not restricted to these embodiments, but that in thecontext of the attached claims modifications or amendments are possible.For example, all kinds of different combinations of individualcharacteristics of the present disclosure can be realized or individualcharacteristics may be omitted.

What is claimed is:
 1. An arrangement, comprising: a holder; a frame inthe holder; a swivel joint connecting the holder and the frame; amembrane having a rim, at least part of the rim being mounted to theframe; and a tautening element between the frame and the holder, whereinthe tautening element is disposed a distance from the swivel joint sothat, during use of the arrangement when the distance between the holderand the frame is modified, the tautening element generates a torque viathe swivel joint.
 2. The arrangement of claim 1, wherein the tauteningelement comprises a plurality of tautening elements distributed aroundat least one circumference selected from the group consisting of acircumference of the membrane and a circumference of the frame.
 3. Thearrangement of claim 1, wherein the frame is elastically deformable. 4.The arrangement of claim 1, wherein the frame comprises a plurality ofseparate retaining elements holding the membrane.
 5. The arrangement ofclaim 1, wherein the tautening element comprises at least one memberselected from the group consisting of an adjusting screw and a piezoactuator.
 6. The arrangement of claim 1, wherein a rotary axis of theswivel joint is parallel to a plane of the membrane.
 7. The arrangementof claim 1, further comprising a spring bar, wherein the frame comprisesfirst and second parts, the first part of the frame is connected to themembrane, the second part of the frame is connectable to the holder, andthe spring bar is between the first and second parts of the frame. 8.The arrangement of claim 7, wherein the spring bar is in a planeparallel to the membrane.
 9. The arrangement of claim 1, wherein themembrane and the frame are monolithic.
 10. The arrangement of claim 1,wherein the holder and the frame are monolithic.
 11. The arrangement ofclaim 1, wherein: a member of the arrangement has a shape selected formthe group consisting of a circular shape, quadratic shape, rectangularshape, polygonal shape, and an oval basic shape; and the member isselected from the group consisting of the membrane, the frame and theholder.
 12. The arrangement of claim 1, wherein the membrane has adimension of from 0.5 millimeter to 200 millimeters, and the dimensionis selected from the group consisting of a diameter of the membrane andan edge length of the membrane.
 13. The arrangement of claim 1, whereinthe membrane has a dimension of from one millimeter to 100 millimeters,and the dimension is selected from the group consisting of a diameter ofthe membrane and an edge length of the membrane.
 14. The arrangement ofclaim 1, wherein the membrane has a thickness of from five nanometers to500 nanometers.
 15. The arrangement of claim 1, wherein the membrane hasa thickness of from 100 nanometers to 250 nanometers.
 16. Thearrangement of claim 1, wherein the membrane comprises multiple plies.17. The arrangement of claim 1, wherein the membrane comprises at leastone member selected from the group consisting of functional elements,filter layers and optically active structures.
 18. The arrangement ofclaim 1, wherein the membrane comprises at least one component selectedfrom the group consisting of silicon, zirconium, ruthenium, rhodium,niobium, molybdenum, boron and silicon nitride.
 19. The arrangement ofclaim 1, wherein the arrangement is configured to be used in EUVmicrolithography.
 20. The arrangement of claim 1, wherein thearrangement is configured so that, when the tautening element generatesa torque via the swivel joint, the frame rotates to modify a tensilestrain exerted on the membrane.
 21. A system, comprising: anarrangement, comprising: a holder; a frame in the holder; a swivel jointconnecting the holder and the frame; a membrane having a rim, at leastpart of the rim being mounted to the frame; a tautening element betweenthe frame and the holder, wherein: the tautening element is disposed adistance from the swivel joint so that, during use of the arrangementwhen the distance between the holder and the frame is modified, thetautening element generates a torque via the swivel joint; and thesystem is a microlithography projection system.
 22. The system of claim21, wherein the system comprises a light source, an illumination systemand projection optics.
 23. The system of claim 22, wherein thearrangement is between the light source and the illumination systemalong a path of light through the system during use of the system. 24.The system of claim 22, wherein the arrangement is downstream of theprojection optics along a path of light through the system during use ofthe system.
 25. The system of claim 22, wherein the arrangement is inthe illumination system.
 26. The system of claim 22, wherein thearrangement is in the projection optics.
 27. The system of claim 21,wherein the arrangement comprises at least one member selected from thegroup consisting of a transmission reticle, a debris filter, anattenuator, a spectral filter, a pellicle, a transmission grate and atransmission filter.
 28. The system of claim 21, wherein the systemcomprises a first part and a second part, and the first and second partsare separated from each other via a gastight separation at leastpartially provided via the arrangement.
 29. The system of claim 21,wherein the system is an EUV microlithography projection system.
 30. Thesystem of claim 21, wherein the arrangement is configured so that, whenthe tautening element generates a torque via the swivel joint, the framerotates to modify a tensile strain exerted on the membrane.